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CuInSe₂ Photovoltaic devices prepared by reactive sputteringLOMMASSON, T. C; TALIEH, H; MEAKIN, J. D et al.Photovoltaic specialists conference. 19. 1987, pp 1285-1290Conference Paper

Optical properties of ZnO : Al films prepared by reactive dc magnetron sputteringGHOSH, S; SARKAR, A; CHAUDHURI, S et al.Vacuum. 1991, Vol 42, Num 10-11, pp 645-648, issn 0042-207XArticle

Hysteresis effect in reactive sputtering: a problem of system stabilityKADLEC, S; MUSIL, J; VYSKOCIL, H et al.Journal of physics. D, Applied physics (Print). 1986, Vol 19, Num 9, pp L187-L190, issn 0022-3727Article

High reflectivity dielectric mirror deposition by reactive magnetron sputteringSCHERER, A; WALTHER, M; SCHIAVONE, L. M et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 5, pp 3305-3311, issn 0734-2101Article

Reactive sputtering of RuO₂ filmsKOLAWA, E; SO, F. C. T; FLICK, W et al.Thin solid films. 1989, Vol 173, Num 2, pp 217-224, issn 0040-6090, 8 p.Article

Indium-tin oxide deposition by d.c. reactive sputtering on a low softening point materialKAWADA, A.Thin solid films. 1990, Vol 191, Num 2, pp 297-303, issn 0040-6090Article

Microstructure and barrier properties of reactively sputtered Ti-W nitrideRAAIJMAKERS, I. J; SETALVAD, T; BHANSALI, A. S et al.Journal of electronic materials. 1990, Vol 19, Num 11, pp 1221-1230, issn 0361-5235Conference Paper

Blazed grating formation in a hollow cathode etcherGROSS, M; WU, Y; HORWITZ, C. M et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1989, Vol 7, Num 6, pp 3213-3216, issn 0734-2101Article

Modeling of reactive sputtering of compound materialsBERG, S; BLOM, H.-O; LARSSON, T et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1987, Vol 5, Num 2, pp 202-207, issn 0734-2101Article

Cellules solaires CdS/CuInS₂, préparées par pulvérisation chimique sans airKAMOUN, N; BELGACEM, S; DACHRAOUI, M et al.Revue de physique appliquée. 1987, Vol 22, Num 9, pp 991-998, issn 0035-1687Article

Influence of oxygen incorporation on the properties of magnetron sputtered hydrogenated amorphous germanium filmsSCHRÖDER, B; ANNEN, A; DRÜSEDAU, T et al.Applied physics letters. 1993, Vol 62, Num 16, pp 1961-1963, issn 0003-6951Article

Studies on glow-discharge characteristics during dc reactive magnetron sputteringMOHAN RAO, G; MOHAN, S.Journal of applied physics. 1991, Vol 69, Num 9, pp 6652-6655, issn 0021-8979Article

Reaktivbeschichtung eines Regenrückhaltebeckens = Revêtement réactif pour un bassin de rétention de la pluie = Reactive coating for a rain retention pondWEIL, J; INGWERSEN, H.Bautenschutz + Bausanierung. 1990, Vol 13, Num 4, pp 38-39, issn 0170-9267, 2 p.Article

A model for reactive sputtering with magnetronsLARSSON, T.Vacuum. 1989, Vol 39, Num 10, pp 949-954, issn 0042-207X, 6 p.Article

Method to design stoichiometric deposition reactive sputtering without hysteresisFADDEEVA, S; OSEGUERA, J.Surface engineering. 2013, Vol 29, Num 7, pp 547-554, issn 0267-0844, 8 p.Article

Recent results on reactive magnetron sputtering for high-rate deposition of ceramic compound filmsBILLARD, A; FRANTZ, C.Materials science forum. 1998, pp 107-116, issn 0255-5476, isbn 0-87849-815-XConference Paper

Sputtered molybdenum oxide thin films for NH₃ detectionMUTSCHALL, D; HOLZNER, K; OBERMEIER, E et al.Sensors and actuators. B, Chemical. 1996, Vol 36, Num 1-3, pp 320-324, issn 0925-4005Conference Paper

D.C. reactive magnetron sputtering of silicon in hydrogen at low substrate temperaturesAVARITSIOTIS, J. N; RODITI, E.Thin solid films. 1990, Vol 187, Num 1, pp 77-90, issn 0040-6090Article

Effects of sputtered particle energy on the properties of SiO₂ filmsOHWAKI, T; TAGA, Y.Applied physics letters. 1989, Vol 55, Num 9, pp 837-839, issn 0003-6951, 3 p.Article

Reactively sputtered RuO₂ diffusion barriersKOLAWA, E; SO, F. C. T; PAN, E. T.-S et al.Applied physics letters. 1987, Vol 50, Num 13, pp 854-855, issn 0003-6951Article

Optical constants of thin TiN films: thickness and preparation effectsVALKONEN, E; RIBBING, C.-G; SUNDGREN, J.-E et al.Applied optics. 1986, Vol 25, Num 20, pp 3624-3630, issn 0003-6935Article

A thermodynamic model of deposition by etching-enhanced reactive sputteringKOSS, V. A; VOSSEN, J. L.Plasma chemistry and plasma processing. 1991, Vol 11, Num 4, pp 439-453, issn 0272-4324Article

Growth and near-ultraviolet optical absorption characteristics of sputter deposited nominal germaniaABUHADBA, N; AITA, C. R.Journal of non-crystalline solids. 1990, Vol 122, Num 3, pp 305-311, issn 0022-3093Article

Reactively sputtered indium tin oxide polycrystalline thin films as NO and NO₂ gas sensorsSBERVEGLIERI, G; BENUSSI, P; COCCOLI, G et al.Thin solid films. 1990, Vol 186, Num 2, pp 349-360, issn 0040-6090Article